Volume No. :   5

Issue No. :  1

Year :  2014

ISSN Print :  0976-2973

ISSN Online :  2321-581X


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Copper Doped Zinc Sulfide Thin Film by Successive Inonic Layer Deposition (Silar) Method



Address:   S. Syed Zahirullah1, J. Joseph Prince2 and M. Shahul Hameed1
1Department of Physics, M.I.E.T. Engineering College, Tiruchirappalli–620 007, Tamilnadu, India.
2Department of Physics, Anna University, Tiruchirappalli–620 024, Tamilnadu, India.
*Corresponding Author
DOI No:

ABSTRACT:
Successive ionic layer adsorption and reaction (SILAR) method, has emerged as one of the solution methods to deposit a variety of compound materials in thin film form. The SILAR method is simple, inexpensive and convenient for large area deposition. In the present work the colloidal solutions as well as thin films on glass substrates of zinc sulfide and zinc sulfide: copper in Poly-Vinyl alcohol matrix have been prepared through chemical route. In the present study the XRD patterns show a mixed type structures having crystal planes of both cubic zinc blend and wurtzite hexagonal phases. The UV-Visible spectra of zinc sulfide and zinc sulfide: copper shows the enhancement of band gap energy due to the quantum size effect.
KEYWORDS:
Zinc sulfide, copper, SILAR, thin film.
Cite:
S. Syed Zahirullah, J. Joseph Prince, M. Shahul Hameed. Copper Doped Zinc Sulfide Thin Film by Successive Inonic Layer Deposition (Silar) Method. Research J. Engineering and Tech. 5(1): Jan.-Mar. 2014 page 05-06.
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